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2011.11.11

vol.16

●Nikkei electronics (Nikkei BB issuance)
The technology of the SUNSAY was introduced to the November 14th issue.
◆The newest medical equipment accelerated to low exposure.◆
The technical development towards low exposure of medical equipment is tinged with heat.
It serves as a backdrop that the patient's consciousness increased to contamination by the nuclear power plant disaster which makes the Great East Japan Earthquake the beginning.
And the technology which is compatible in the performance of the main part of medical equipment and large low exposure began to appear one after another.
At our company, high sensitivitization was realized by raising the surface accuracy of the ESC (electrostatic) zipper which is the key technology of phosphor manufacture into which the uniform crystal of CSI (cesium iodide) is grown up to 4?20 mm (24m/1 million).

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2011.10.27

vol.15

■TMS workshop
We are introduced as the exhibition information and a lecturer of TMS commemorative workshop.
◆SUNSAY Industries Co., Ltd.
SUNSAY is a top venture which has obtained evaluation of reliance greatest than the major manufacturer of the semiconductor industry and the liquid crystal industry of the world, and creative skill power. Matcher and plasma oscillating generator have a good track record in durability and stability of high-precision control. As a result, it is applied in comfort in the worldwide factory line. Moreover, the track record of the improvement in manufacturing efficiency and cost merit increase is shown!
The wafer transfer robot excellent in high vacuum and high temperature durability is growing to the standard level of the industry as high precision and enhanced life products!

 

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2011.7.19

vol.14

Our homepage was wholly-redesigned.
Since the page only for a visitor which can confirm the manufacturing process of the ordered product will also prepare from now on, please utilize.
Your further cooperation in this project will be much appreciated.

 

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2011.5.31

vol.13

The presentation was carried out in SEMI FORUM JAPAN 2011.
Lecture title:Introduction of the semiconductor newest ultra-fine processing technology
Lecture summary:Introduction of the 2X~3Xnm ETCHING SYSTEM
          Introduction of the high pressure ICP PLASMA SYSTEM

 

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2010.6.27

vol.12

ISMI / SEMATECH in Japan   About the process improvement before a semiconductor
A presentation was carried out over 30 minutes as a panelist.
During a holding period, we are exhibiting our apparatus.

 

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2009.6.27

vol.11

ISMI / SEMATECH in Japan   About the process improvement before a semiconductor
A presentation was carried out over 30 minutes as a panelist.
During a holding period, we are exhibiting our apparatus.

 

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2008.6.29

vol.10

SUNSAY was introduced to the "best company magazine" of Tokyo Shoko Research, Ltd. issue for students as three stars company.

 

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2008.6.27

vol.9

Silicon World  
Featuring The suppliers of Semiconductor Equipment Materials & Services
CVD/PVD/RTP Dry ETCH/Stripper Automation/Robotics
Nominate Analysis Measurement

 

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2008.6.27

vol.8

ISMI / SEMATECH in Japan About the process improvement before a semiconductor
A presentation was carried out over 30 minutes as a panelist.
During a holding period, we are exhibiting our apparatus.

 

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2007.12.1

vol.7

SUNSAY was greatly published by Only1 and No.1 special edition in the Chugoku Shimbun.
"Electric appliances and a car are supported."
Presentation about high-speed RF MATCHING BOX and RF measurement.

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